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 Übersetzung für 'sputtering' von Englisch nach Deutsch
NOUN   sputtering | -
VERB   to sputter | sputtered | sputtered
sputtering | sputters
SYNO spatter | spattering | splatter | ...
sputtering {adj}plappernd [ugs.]
138
sputtering {adj}brutzelnd
20
Substantive
sputteringGeknatter {n} [ugs.] [Motor]
34
electr.phys.
sputtering
Kathodenzerstäubung {f}
7
electr.phys.
sputtering
Sputtern {n}
6
2 Wörter
electr.tech.
radiofrequency sputtering <RF sputtering>
Hochfrequenz-Sputtern {n} <HF-Sputtern>
3 Wörter
electr.tech.
direct current sputtering <DC sputtering>
Gleichspannungs­sputtern {n}
4 Wörter
electr.tech.
direct current diode sputtering <DC diode sputtering>
DC-Dioden-Sputtern {n}
electr.tech.
direct current triode sputtering <DC triode sputtering>
DC-Trioden-Sputtern {n}
electr.
sputter / sputtering ion source
Sputter-Ionenquelle {f}
5+ Wörter
engin.materialtech.
high-power impulse magnetron sputtering <HiPIMS>
Hochenergieimpulsmagnetronsputtern {n} <HiPIMS>
11 Übersetzungen
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Anwendungsbeispiele Englisch
  • Issues for ion beam figuring included re-sputtering and contamination.
  • Some disadvantages of the sputtering process are that the process is more difficult to combine with a lift-off for structuring the film.
  • At low primary beam currents, very little material is sputtered and modern FIB systems can easily achieve 5 nm imaging resolution (imaging resolution with Ga ions is limited to ~5 nm by sputtering and detector efficiency).
  • Driving Nixies outside of their specified electrical parameters will accelerate their demise, especially excess current, which increases sputtering of the electrodes.
  • Focused ion beam systems are commonly used today for sputtering away defects or uncovering buried features. The use of ion sputtering must take into account the redeposition of sputtered material.

  • Ion beam application, etching, or sputtering, is a technique conceptually similar to sandblasting, but using individual atoms in an ion beam to ablate a target.
  • Other methods include electrodeposition, magnetron sputtering, chemical electroless plating, and screen printing onto the substrate.
  • Sputtering (in particular radio-frequency magnetron sputtering) has been applied to the fabrication of LAGP thin-films starting from a LAGP target.
  • However, sputtering is not desirable when glow discharge is used for lighting, because it shortens the life of the lamp.
  • Some windows use laminate polyester film where at least one layer has been metalized using a process called sputtering.

  • A less traditional technique is to use focused ion beam sputtering (FIB) to remove material.
  • Sputtering is one of the forms of space weathering, a process that changes the physical and chemical properties of airless bodies, such as asteroids and the Moon.
  • The metal films can be deposited by evaporation, sputtering or electroplating.
  • For AZO thin film deposition, the coating method of reactive magnetron sputtering is very economical and practical way of mass production.
  • EPV uses a hybrid between coevaporation and sputtering in which In and Ga are evaporated in a Se atmosphere.

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    Enthält Übersetzungen von der TU Chemnitz sowie aus Mr Honey's Business Dictionary (nur Englisch/Deutsch).
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